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A dry development process for EUV resist with vertically tailored structure: Chemical Vapor Development (CVD)
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2025-01-26T11:00:25Z | - |
| dc.date.available | 2025-01-26T11:00:25Z | - |
| dc.date.issued | 2025-01-17 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/206337 | - |
| dc.title | A dry development process for EUV resist with vertically tailored structure: Chemical Vapor Development (CVD) | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | nano convergence conference 2025 | - |
| dc.citation.conferencePlace | 대전 | - |
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)