Cited 0 time in
Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (vol 23, 041402, 2024)
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shen, Tao | - |
| dc.contributor.author | Mochi, Iacopo | - |
| dc.contributor.author | Jeong, Dongmin | - |
| dc.contributor.author | Mueller, Elisabeth | - |
| dc.contributor.author | Ansuinelli, Paolo | - |
| dc.contributor.author | Ahn, Jinho | - |
| dc.contributor.author | Ekinci, Yasin | - |
| dc.date.accessioned | 2025-02-12T06:01:06Z | - |
| dc.date.available | 2025-02-12T06:01:06Z | - |
| dc.date.issued | 2024-10 | - |
| dc.identifier.issn | 1932-5150 | - |
| dc.identifier.issn | 1932-5134 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/206410 | - |
| dc.description.abstract | This article [J. Micro/Nanopattern. Mater. Metrol., 23(4), 041402 (2024) https://doi.org/10 .1117/1.JMM.23.4.041402] was originally published online on 12 July 2024 with errors in Table 1 and in the Materials and Methods section. STEM measurements in the table and their corresponding mentions in the text were incorrect. The original table is shown below: (Table presented). | - |
| dc.format.extent | 2 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | SPIE - International Society for Optical Engineering | - |
| dc.title | Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (vol 23, 041402, 2024) | - |
| dc.title.alternative | Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum) Erratum: Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank ([J. Micro/Nanopattern. Mater. Metrol. (2024) 23:4 (041402) DOI: 10.1117/1.JMM.23.4.041402) | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1117/1.JMM.23.4.049801 | - |
| dc.identifier.scopusid | 2-s2.0-85214106245 | - |
| dc.identifier.wosid | 001389147600006 | - |
| dc.identifier.bibliographicCitation | Journal of Micro/ Nanolithography, MEMS, and MOEMS, v.23, no.4, pp 1 - 2 | - |
| dc.citation.title | Journal of Micro/ Nanolithography, MEMS, and MOEMS | - |
| dc.citation.volume | 23 | - |
| dc.citation.number | 4 | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 2 | - |
| dc.type.docType | Correction | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Engineering | - |
| dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Optics | - |
| dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
| dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Optics | - |
| dc.identifier.url | https://www.spiedigitallibrary.org/journals/journal-of-micro-nanopatterning-materials-and-metrology/volume-23/issue-04/049801/Spectral-reflectometry-characterization-of-an-extreme-ultraviolet-attenuated-phase-shifting/10.1117/1.JMM.23.4.049801.full | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1366
COPYRIGHT © 2024 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
