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열처리 온도에 따른 Ru/SiGe 계면에서의 반응을 통한 접촉저항 공정 평가
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2025-02-23T11:00:25Z | - |
| dc.date.available | 2025-02-23T11:00:25Z | - |
| dc.date.issued | 2025-02-13 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/206539 | - |
| dc.title | 열처리 온도에 따른 Ru/SiGe 계면에서의 반응을 통한 접촉저항 공정 평가 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 32th Korean Conference on Semiconductors | - |
| dc.citation.conferencePlace | 강원도 하이원리조트 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)