Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
EUV ptychography microscope를 이용한 주기성 마스크 패턴의 고신뢰성 actinic 검사를 위한 EUV ptychography imaging 연구
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2025-02-23T11:00:26Z | - |
| dc.date.available | 2025-02-23T11:00:26Z | - |
| dc.date.issued | 2025-02-13 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/206544 | - |
| dc.title | EUV ptychography microscope를 이용한 주기성 마스크 패턴의 고신뢰성 actinic 검사를 위한 EUV ptychography imaging 연구 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 32th Korean Conference on Semiconductors | - |
| dc.citation.conferencePlace | 강원도 하이원리조트 | - |
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)