Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

A method for measuring individual ion density in an Ar/He mixture inductively coupled plasma

Full metadata record
DC Field Value Language
dc.contributor.authorSon, Jin-Ung-
dc.contributor.authorLee, Moo-Hyun-
dc.contributor.authorKim, Min-Seok-
dc.contributor.authorJung, Jiwon-
dc.contributor.authorSeo, Beom-Jun-
dc.contributor.authorKim, Ju-Ho-
dc.contributor.authorChung, Chin-Wook-
dc.date.accessioned2025-04-01T08:00:55Z-
dc.date.available2025-04-01T08:00:55Z-
dc.date.issued2025-03-
dc.identifier.issn0963-0252-
dc.identifier.issn1361-6595-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/206930-
dc.description.abstractA method for measuring individual ion density and for measuring radial distribution is developed in an argon/helium mixture inductively coupled plasma using the floating harmonic method (FHM) and the electron energy probability function (EEPF) measurement. In order to measure the ion density, the ion saturation current is measured using the FHM, and the electron temperature and electron density are obtained from the EEPF measurement. In addition, plasma quasi-neutrality, ion acoustic wave dispersion relation, and ion saturation current formula are used to obtain the ion density. Ion density is compared for the case of using the common Bohm velocity and for the case of using the individual Bohm velocity. Under various conditions, increasing power results in higher density of both argon and helium ion, while argon ion density increase and helium ion density decreases with pressure. With increasing argon ratio and pressure, electron density increases, but electron temperature deceases. Consequently, fewer electrons are available to ionize He, leading to a reduction in helium ion density. The measured radial distributions of argon and helium ion at 5 mTorr reveal that the argon ion distribution exhibits a center-high distribution, whereas the helium ion distribution is relatively uniform.-
dc.format.extent10-
dc.language영어-
dc.language.isoENG-
dc.publisherInstitute of Physics Publishing-
dc.titleA method for measuring individual ion density in an Ar/He mixture inductively coupled plasma-
dc.typeArticle-
dc.publisher.location영국-
dc.identifier.doi10.1088/1361-6595/adb3ca-
dc.identifier.scopusid2-s2.0-86000541006-
dc.identifier.wosid001441252200001-
dc.identifier.bibliographicCitationPlasma Sources Science and Technology, v.34, no.3, pp 1 - 10-
dc.citation.titlePlasma Sources Science and Technology-
dc.citation.volume34-
dc.citation.number3-
dc.citation.startPage1-
dc.citation.endPage10-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Fluids & Plasmas-
dc.subject.keywordPlusELECTRON-TEMPERATURE-
dc.subject.keywordPlusENERGY-
dc.subject.keywordPlusVELOCITY-
dc.subject.keywordPlusKINETICS-
dc.subject.keywordPlusSHEATH-
dc.subject.keywordAuthorinductively coupled plasma-
dc.subject.keywordAuthorAr/He mixture-
dc.subject.keywordAuthorion density-
dc.subject.keywordAuthorfloating harmonic method-
dc.subject.keywordAuthorelectron energy probability function-
dc.identifier.urlhttps://iopscience.iop.org/article/10.1088/1361-6595/adb3ca-
Files in This Item
Go to Link
Appears in
Collections
서울 공과대학 > ETC > 1. Journal Articles
서울 공과대학 > 서울 전기공학전공 > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Chung, Chin Wook photo

Chung, Chin Wook
COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)
Read more

Altmetrics

Total Views & Downloads

BROWSE