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Alkylammonium passivation for 2D tin halide perovskite field-effect transistors

Authors
Kim, HakjunLee, Cheong BeomJeong, Bum HoLee, JongminJia, ChoiKim, KyeounghakPark, Hui Joon
Issue Date
Mar-2025
Publisher
Royal Society of Chemistry
Citation
Journal of Materials Chemistry C, v.13, no.13, pp 6806 - 6815
Pages
10
Indexed
SCIE
SCOPUS
Journal Title
Journal of Materials Chemistry C
Volume
13
Number
13
Start Page
6806
End Page
6815
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/207194
DOI
10.1039/d4tc05307a
ISSN
2050-7526
2050-7534
Abstract
Tin (Sn) halide perovskites have shown significant potential as channels for field-effect transistors (FETs) due to their low effective mass, reduced Fr & ouml;hlich interaction, as well as lead-free composition, a requirement for electronic components. However, their inherent instability has limited their practical application. Here, we reveal that alkyl ammonium additives of appropriate size can efficiently passivate A-site defects in two-dimensional (2D) Sn halide perovskites, thereby promoting ideal octahedral formation and enhancing hydrogen bonding between A-site and X-site components. These effects lead to improved structural stability, as evidenced by enhanced crystallinity, reduced non-radiative recombination, and decreased Sn oxidation. FETs incorporating perovskites with alkylammonium cations of optimal chain length and multiple functional groups-specifically, propane-1,3-diammonium iodide-exhibit superior performance metrics, including a maximum field-effect mobility of 2.6 cm2 V-1 s-1, an on/off current ratio exceeding 106, and a threshold voltage approaching 0 V.
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COLLEGE OF ENGINEERING (DEPARTMENT OF CHEMICAL ENGINEERING)
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