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Rapid turn-on voltage engineering of a-IGZO TFTs using xenon flash lamp annealing for logic-compatible oxide electronics

Authors
Jeong, Yun HyeokLee, Won WooLee, Dong HyunLee, Han-KooPark, Jae YeonYoo, HocheonKwon, Sang JikPark, Min-KyuCho, Eou-Sik
Issue Date
Oct-2025
Publisher
Royal Society of Chemistry
Citation
Nanoscale, v.17, no.37, pp 21602 - 21613
Pages
12
Indexed
SCIE
SCOPUS
Journal Title
Nanoscale
Volume
17
Number
37
Start Page
21602
End Page
21613
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/208875
DOI
10.1039/d5nr02269j
ISSN
2040-3364
2040-3372
Abstract
Amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs) are widely used in flexible and stretchable electronic devices due to their excellent electrical properties and low-temperature process compatibility. As display technologies advance toward higher integration and flexibility, the demand for logic circuits within display panels is growing, necessitating more versatile and stable oxide TFT performance. To this end, a-IGZO TFTs are treated using xenon flash lamp annealing (XFLA), a rapid photonic technique capable of passivating defects without thermal damage. The XFLA-treated devices exhibit improved electrical characteristics, including a positive shift in turn-on voltage, reduced subthreshold swing, and decreased off-current. Based on these improvements, the circuit-level potential of XFLA was explored by implementing an NMOS inverter using a pristine a-IGZO as the depletion-mode load and an XFLA-treated TFT as the enhancement-mode driver. These results suggest that XFLA offers a practical route for turn-on voltage modulation in oxide semiconductors, enabling their use in integrated logic circuits for future display technologies.
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