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High-NA EUV 흡수 소재 선정을 위한 Mask 3D effect 완화 광학상수 영역 분석 연구
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2025-12-10T16:32:42Z | - |
| dc.date.available | 2025-12-10T16:32:42Z | - |
| dc.date.issued | 2025-08-11 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/209708 | - |
| dc.title | High-NA EUV 흡수 소재 선정을 위한 Mask 3D effect 완화 광학상수 영역 분석 연구 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2025 차세대 리소그래피 학술대회 | - |
| dc.citation.conferencePlace | 수원컨벤션센터 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)