Effect of Side Lobe Intensity and Photon Shot Noise Effect on the Missing Hole Phenomenon in Extreme Ultraviolet Lithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jung Sik | - |
dc.contributor.author | Hong, Seongchul | - |
dc.contributor.author | Jang, Yong Ju | - |
dc.contributor.author | Ahn, Jinho | - |
dc.date.accessioned | 2021-08-02T15:51:04Z | - |
dc.date.available | 2021-08-02T15:51:04Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2017-02 | - |
dc.identifier.issn | 1738-8228 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/21180 | - |
dc.description.abstract | The missing hole phenomenon in a wafer pattern is a critical issue in extreme ultraviolet lithography. It occurs randomly, even when the process conditions are consistent. The main reason for this phenomenon is thought to be the photon shot noise effect, which is a random reaction between photons and photoresist particles. We speculate that side lobe intensity can be another reason, since the missing hole is affected by the light distribution of the main hole pattern. To confirm the effect of side lobe intensity and photon shot noise on the missing hole phenomenon, we used an attenuated phase shift mask (PSM), whose reflectivity can be changed without varying the total absorber stack thickness. The results show that the photon shot noise effect and the side lobe intensity are both affected by the reflectivity of the PSM and are the critical factors for the missing holes. | - |
dc.language | 한국어 | - |
dc.language.iso | ko | - |
dc.publisher | KOREAN INST METALS MATERIALS | - |
dc.title | Effect of Side Lobe Intensity and Photon Shot Noise Effect on the Missing Hole Phenomenon in Extreme Ultraviolet Lithography | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Ahn, Jinho | - |
dc.identifier.doi | 10.3365/KJMM.2017.55.2.139 | - |
dc.identifier.scopusid | 2-s2.0-85015311104 | - |
dc.identifier.wosid | 000393627200009 | - |
dc.identifier.bibliographicCitation | KOREAN JOURNAL OF METALS AND MATERIALS, v.55, no.2, pp.139 - 143 | - |
dc.relation.isPartOf | KOREAN JOURNAL OF METALS AND MATERIALS | - |
dc.citation.title | KOREAN JOURNAL OF METALS AND MATERIALS | - |
dc.citation.volume | 55 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 139 | - |
dc.citation.endPage | 143 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART002195242 | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | Y | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Metallurgy & Metallurgical Engineering | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Metallurgy & Metallurgical Engineering | - |
dc.subject.keywordPlus | ABSORBER | - |
dc.subject.keywordAuthor | EUV phase shift mask | - |
dc.subject.keywordAuthor | lithography simulation | - |
dc.subject.keywordAuthor | missing hole | - |
dc.subject.keywordAuthor | photon shot noise effect | - |
dc.subject.keywordAuthor | side lobe intensity | - |
dc.identifier.url | http://kjmm.org/journal/view.php?doi=10.3365/KJMM.2017.55.2.139 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1365
COPYRIGHT © 2021 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.