High performance TF-SOFCs with defect-free electrolyte manufactured via controlled reactive sputtering

Abstract

This study explores the deposition behavior and performance of thin-film solid oxide fuel cells (SOFCs) by using the sputtering technique, which is commonly used to deposit electrolytes on anode-supported substrates with varying surface roughness. It is well known that the roughness of the underlying substrate during sputtering significantly affects the characteristics and quality of the resulting thin film. To investigate the impact of such properties on SOFC performance, a polishing process is used herein to adjust surface roughness of the substrate, and the subsequent changes during SOFC operation are observed. The findings reveal that reducing the substrate roughness helps to prevent the formation of pinholes and cracks during the deposition process and alleviate electrolyte-anode interfacial instability, ultimately leading to enhanced performance. As a result, the SOFC fabricated using the polished substrate demonstrates a high open-circuit voltage (OCV) of 1.121 V and a peak power density of 2.038 W/cm2 at 750 °C.