Cited 0 time in
First demonstration of federated learning with homomorphic encryption using vertically-stacked ferroelectric tunnel junction
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jeong-Han | - |
| dc.contributor.author | Im, Jiseong | - |
| dc.contributor.author | Song, Minsuk | - |
| dc.contributor.author | Yoo, Yelin | - |
| dc.contributor.author | Lee, Jongwoo | - |
| dc.contributor.author | Koo, Ryun-Han | - |
| dc.contributor.author | Kim, Jangsaeng | - |
| dc.contributor.author | Kwon, Daewoong | - |
| dc.date.accessioned | 2026-06-05T06:00:16Z | - |
| dc.date.available | 2026-06-05T06:00:16Z | - |
| dc.date.issued | 2026-01 | - |
| dc.identifier.issn | 0163-1918 | - |
| dc.identifier.issn | 2156-017X | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213063 | - |
| dc.description.abstract | A novel vertical ferroelectric tunnel junction (VFTJ) array enabling hardware-level implementation of homomorphic encryption (HE) for secure federated learning (FL) is proposed. A highly integrated 4-stack TiN/SiO2 structure with vertically etched hole-type architecture was fabricated. Distinct ferroelectric and ionic switching induced by interfacial TiOx formation significantly enhanced tunneling electroresistance (TER) and switching reliability. The intrinsic randomness of devices enabled the realization of polynomial samplers (ternary, Gaussian, uniform) essential for HE schemes. The proposed VFTJ-based FL achieves accuracy comparable to the software baseline, exhibiting less than 4% accuracy reduction under highly non-IID conditions | - |
| dc.format.extent | 4 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | IEEE | - |
| dc.title | First demonstration of federated learning with homomorphic encryption using vertically-stacked ferroelectric tunnel junction | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1109/IEDM50572.2025.11353691 | - |
| dc.identifier.scopusid | 2-s2.0-105033554971 | - |
| dc.identifier.wosid | 001701480300150 | - |
| dc.identifier.bibliographicCitation | 2025 IEEE International Electron Devices Meeting (IEDM), pp 1 - 4 | - |
| dc.citation.title | 2025 IEEE International Electron Devices Meeting (IEDM) | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 4 | - |
| dc.type.docType | Conference paper | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Computer Science | - |
| dc.relation.journalResearchArea | Engineering | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Computer Science, Hardware & Architecture | - |
| dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | Cryptography | - |
| dc.subject.keywordPlus | Ferroelectric devices | - |
| dc.subject.keywordPlus | Ferroelectric materials | - |
| dc.subject.keywordPlus | Ferroelectricity | - |
| dc.subject.keywordPlus | Hardware security | - |
| dc.subject.keywordPlus | Silicon compounds | - |
| dc.subject.keywordPlus | Titanium compounds | - |
| dc.identifier.url | https://ieeexplore.ieee.org/document/11353691 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1366
COPYRIGHT © 2024 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
