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Reliable actinic mask evaluation via high-frequency signal enhancement in EUV ptychography
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2026-06-20T18:05:33Z | - |
| dc.date.available | 2026-06-20T18:05:33Z | - |
| dc.date.issued | 2026-02-25 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213639 | - |
| dc.title | Reliable actinic mask evaluation via high-frequency signal enhancement in EUV ptychography | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2026 SPIE Advanced Lithography + Patterning | - |
| dc.citation.conferencePlace | 미국 | - |
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)