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이미징 성능 및 Best Focus Shift 완화를 위한 High-NA EUV 마스크용 Bilayer 흡수체 구조 연구
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2026-06-20T18:31:00Z | - |
| dc.date.available | 2026-06-20T18:31:00Z | - |
| dc.date.issued | 2026-01-29 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213645 | - |
| dc.title | 이미징 성능 및 Best Focus Shift 완화를 위한 High-NA EUV 마스크용 Bilayer 흡수체 구조 연구 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 33nd Korean Conference on Semiconductors | - |
| dc.citation.conferencePlace | 강원도 하이원리조트 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)