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Development of a 2D Axisymmetric PIC Simulation for Improved Plasma Uniformity in RF Etching Processes
- Authors
- 이정표
- Issue Date
- 12-Jun-2025
- Place
- 대전 컨벤션센터
- Conference Name
- International Fusion and Plasma conference
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Collections - 서울 공과대학 > 서울 원자력공학과 > 2. Conference Papers
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Related Researcher
- Lee, Jungpyo
- COLLEGE OF ENGINEERING (DEPARTMENT OF NUCLEAR ENGINEERING)