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Photodegradable Polycaprolactone-Urethane Enabling Dual-Tone Micropatterning for Sustainable Microfabrication
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Yoon, Sangmin | - |
| dc.contributor.author | Ok, Jaehun | - |
| dc.contributor.author | Jin, Soyeong | - |
| dc.contributor.author | Kang, Youngjong | - |
| dc.contributor.author | Jeong, Youngdo | - |
| dc.contributor.author | Cho, Sangho | - |
| dc.contributor.author | Kim, Myungwoong | - |
| dc.date.accessioned | 2026-07-06T06:30:15Z | - |
| dc.date.available | 2026-07-06T06:30:15Z | - |
| dc.date.issued | 2026-06 | - |
| dc.identifier.issn | 2637-6105 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/218041 | - |
| dc.description.abstract | Micropatterning underpins applications in bioelectronics, photonics, and lab-on-a-chip systems; however, current dual-tone photoresists are predominantly nondegradable, limiting their sustainability and biocompatibility. Here, we present photodegradable poly(caprolactone-urethane) (PCLU) photoresists incorporating o-nitrobenzyl (oNB) moieties as a novel dual-tone system. By tuning the composition of the polycaprolactone (PCL) units, oNB diol units, and diisocyanate linkages, the resulting polymers exhibit dose-dependent solubility under 365 nm irradiation, enabling both positive- and negative-tone micropatterning from a single formulation. Mechanistic analyses, combining spectroscopic and physicochemical characterizations, reveal that the dual-tone response arises from the interplay between polymer chain scission and secondary photochemical reactions. Preliminary cytotoxicity assessments indicate favorable cytocompatibility, suggesting that PCLU photoresists could serve as a versatile platform for the development of more sustainable microfabrication in electronics, photonics, and biomedical applications. | - |
| dc.format.extent | 13 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | AMER CHEMICAL SOC | - |
| dc.title | Photodegradable Polycaprolactone-Urethane Enabling Dual-Tone Micropatterning for Sustainable Microfabrication | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1021/acsapm.6c00981 | - |
| dc.identifier.scopusid | 2-s2.0-105042924666 | - |
| dc.identifier.wosid | 001788294200001 | - |
| dc.identifier.bibliographicCitation | ACS APPLIED POLYMER MATERIALS, v.8, no.12, pp 9309 - 9321 | - |
| dc.citation.title | ACS APPLIED POLYMER MATERIALS | - |
| dc.citation.volume | 8 | - |
| dc.citation.number | 12 | - |
| dc.citation.startPage | 9309 | - |
| dc.citation.endPage | 9321 | - |
| dc.type.docType | Article; Early Access | - |
| dc.description.isOpenAccess | Y | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Polymer Science | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Polymer Science | - |
| dc.subject.keywordPlus | BIODEGRADABLE POLYMERS | - |
| dc.subject.keywordPlus | CROSS-LINKING | - |
| dc.subject.keywordPlus | PHOTORESIST | - |
| dc.subject.keywordAuthor | dual-tone photoresist | - |
| dc.subject.keywordAuthor | polycaprolactone-urethane | - |
| dc.subject.keywordAuthor | micropatterning | - |
| dc.subject.keywordAuthor | biocompatible photoresist | - |
| dc.subject.keywordAuthor | photodegradable polyurethane | - |
| dc.identifier.url | https://pubs.acs.org/doi/10.1021/acsapm.6c00981 | - |
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