Photodegradable Polycaprolactone-Urethane Enabling Dual-Tone Micropatterning for Sustainable Microfabricationopen access
- Authors
- Yoon, Sangmin; Ok, Jaehun; Jin, Soyeong; Kang, Youngjong; Jeong, Youngdo; Cho, Sangho; Kim, Myungwoong
- Issue Date
- Jun-2026
- Publisher
- AMER CHEMICAL SOC
- Keywords
- dual-tone photoresist; polycaprolactone-urethane; micropatterning; biocompatible photoresist; photodegradable polyurethane
- Citation
- ACS APPLIED POLYMER MATERIALS, v.8, no.12, pp 9309 - 9321
- Pages
- 13
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS APPLIED POLYMER MATERIALS
- Volume
- 8
- Number
- 12
- Start Page
- 9309
- End Page
- 9321
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/218041
- DOI
- 10.1021/acsapm.6c00981
- ISSN
- 2637-6105
- Abstract
- Micropatterning underpins applications in bioelectronics, photonics, and lab-on-a-chip systems; however, current dual-tone photoresists are predominantly nondegradable, limiting their sustainability and biocompatibility. Here, we present photodegradable poly(caprolactone-urethane) (PCLU) photoresists incorporating o-nitrobenzyl (oNB) moieties as a novel dual-tone system. By tuning the composition of the polycaprolactone (PCL) units, oNB diol units, and diisocyanate linkages, the resulting polymers exhibit dose-dependent solubility under 365 nm irradiation, enabling both positive- and negative-tone micropatterning from a single formulation. Mechanistic analyses, combining spectroscopic and physicochemical characterizations, reveal that the dual-tone response arises from the interplay between polymer chain scission and secondary photochemical reactions. Preliminary cytotoxicity assessments indicate favorable cytocompatibility, suggesting that PCLU photoresists could serve as a versatile platform for the development of more sustainable microfabrication in electronics, photonics, and biomedical applications.
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