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Photodegradable Polycaprolactone-Urethane Enabling Dual-Tone Micropatterning for Sustainable Microfabricationopen access

Authors
Yoon, SangminOk, JaehunJin, SoyeongKang, YoungjongJeong, YoungdoCho, SanghoKim, Myungwoong
Issue Date
Jun-2026
Publisher
AMER CHEMICAL SOC
Keywords
dual-tone photoresist; polycaprolactone-urethane; micropatterning; biocompatible photoresist; photodegradable polyurethane
Citation
ACS APPLIED POLYMER MATERIALS, v.8, no.12, pp 9309 - 9321
Pages
13
Indexed
SCIE
SCOPUS
Journal Title
ACS APPLIED POLYMER MATERIALS
Volume
8
Number
12
Start Page
9309
End Page
9321
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/218041
DOI
10.1021/acsapm.6c00981
ISSN
2637-6105
Abstract
Micropatterning underpins applications in bioelectronics, photonics, and lab-on-a-chip systems; however, current dual-tone photoresists are predominantly nondegradable, limiting their sustainability and biocompatibility. Here, we present photodegradable poly(caprolactone-urethane) (PCLU) photoresists incorporating o-nitrobenzyl (oNB) moieties as a novel dual-tone system. By tuning the composition of the polycaprolactone (PCL) units, oNB diol units, and diisocyanate linkages, the resulting polymers exhibit dose-dependent solubility under 365 nm irradiation, enabling both positive- and negative-tone micropatterning from a single formulation. Mechanistic analyses, combining spectroscopic and physicochemical characterizations, reveal that the dual-tone response arises from the interplay between polymer chain scission and secondary photochemical reactions. Preliminary cytotoxicity assessments indicate favorable cytocompatibility, suggesting that PCLU photoresists could serve as a versatile platform for the development of more sustainable microfabrication in electronics, photonics, and biomedical applications.
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