Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
초저온 전자온도 플라즈마를 활용한 Gate-All-Around FET 제조 공정에서의 플라즈마 유발 손상 저감
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 정진욱 | - |
| dc.date.accessioned | 2026-07-06T07:06:02Z | - |
| dc.date.available | 2026-07-06T07:06:02Z | - |
| dc.date.issued | 2025-08-22 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/218077 | - |
| dc.title | 초저온 전자온도 플라즈마를 활용한 Gate-All-Around FET 제조 공정에서의 플라즈마 유발 손상 저감 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제69회 한국진공학회 | - |
| dc.citation.conferencePlace | Phoenix Island, Jeju, Korea | - |
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)