Development of Extreme Ultraviolet Pellicles Based on Yttrium Core with Amorphous Carbon Capping Layeropen access
- Authors
- Seong, Kihun; Kim, Hye-Young; Kim, Yongkyung; Kim, Hyeongkeun; Kim, Won Jin; Moon, Seungchan; Ahn, Jinho; Kim, Seul-Gi; Kim, Hyun-Mi
- Issue Date
- Jul-2026
- Publisher
- KOREAN INST METALS MATERIALS
- Keywords
- EUV pellicles; EUV transmittance; Y core pellicles; Y oxidation; Amorphous carbon capping layers
- Citation
- ELECTRONIC MATERIALS LETTERS, v.22, no.4, pp 381 - 392
- Pages
- 12
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- ELECTRONIC MATERIALS LETTERS
- Volume
- 22
- Number
- 4
- Start Page
- 381
- End Page
- 392
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/219102
- DOI
- 10.1007/s13391-026-00630-x
- ISSN
- 1738-8090
2093-6788
- Abstract
- Yttrium offers exceptional intrinsic extreme ultraviolet (EUV) transmittance and emissivity for next-generation pellicles. However, its severe oxidation susceptibility limits its practical implementation. In this study, we demonstrate that amorphous carbon (a-C) capping layers effectively preserve metallic Y, whereas plasma-enhanced atomic-layer-deposited SiNx causes catastrophic oxidation. Our standalone a-C/Y/a-C film achieves 86.8% EUV transmittance and exhibits remarkable thermal stability, maintaining approximate to 400 degrees C peak temperature for over 1000 cycles under 1 W/cm(2) absorbed power. Transmission electron microscopy analysis of the freestanding membrane revealed substantial fluorine penetration throughout the Y core during back-etching, driven by a strong Y-F thermodynamic affinity. Despite the compositional change, the film retained its robust thermal performance. These results establish a-C-capped Y as a viable high-powered EUV pellicle, demonstrating that strategic material design can overcome intrinsic oxidation challenges while delivering the optical and thermal properties required for advanced lithography.
- Files in This Item
-
Go to Link
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 1. Journal Articles

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.