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Kesterite Cu2ZnSnS4 (CZTS) Thin Film Formation Using Sequential Annealing Process Under N₂ and H₂S Atmosphere

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dc.contributor.authorChoi, Moonsuk-
dc.contributor.authorGil, Youngin-
dc.contributor.authorShim, Jaewoo-
dc.contributor.authorPark, Jin-Hong-
dc.contributor.authorChoi, Changhwan-
dc.date.accessioned2021-08-02T16:28:14Z-
dc.date.available2021-08-02T16:28:14Z-
dc.date.created2021-05-12-
dc.date.issued2016-09-
dc.identifier.issn1947-2935-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/22222-
dc.description.abstractCu₂ZnSnS₄ (CZTS) thin films have been prepared by a two-step sequential annealing process under N₂ and H₂S atmospheres at 500 and 550 °C on physical vapor deposited (PVD) precursors, where the orders of the precursor stack are Sn/ZnS/Cu and ZnS/Cu/Sn on a soda-lime glass (SLG) substrate. The Sn/ZnS/Cu precursor is converted into Cu₂SnS₃ and Cu6Sn5 with N₂ annealing, and the (112) preferred orientation of the kesterite CZTS phase is detected with subsequent H₂S annealing. However, no complete CZTS phase is attained from the ZnS/Cu/Sn precursor using sequential annealing where some secondary phases such as Cu₄SnS₄, Cu₆Sn₅, Cu₂S and CuZn are formed, suggesting that ZnS significantly affects the final CZTS structure. The CZTS thin films exhibit an optical band gap with a range of 1.50 to 1.71 eV with sequential N₂ +H₂S annealing. The films are confirmed to be p-type semiconductors and the electrical properties include carrier concentration (2×10¹⁸ to 3.5×1019 cm⁻³), hole mobility (40 to 1780 cm²/V · s) and resistivity (1.7×10⁻² to 1.6×10⁻³Ω·cm).-
dc.language영어-
dc.language.isoen-
dc.publisherAMER SCIENTIFIC PUBLISHERS-
dc.titleKesterite Cu2ZnSnS4 (CZTS) Thin Film Formation Using Sequential Annealing Process Under N₂ and H₂S Atmosphere-
dc.title.alternativeKesterite Cu2ZnSnS4 (CZTS) Thin Film Formation Using Sequential Annealing Process Under N-2 and H2S Atmosphere-
dc.typeArticle-
dc.contributor.affiliatedAuthorChoi, Changhwan-
dc.identifier.doi10.1166/sam.2016.2913-
dc.identifier.scopusid2-s2.0-85012054764-
dc.identifier.wosid000392835600012-
dc.identifier.bibliographicCitationSCIENCE OF ADVANCED MATERIALS, v.8, no.9, pp.1790 - 1794-
dc.relation.isPartOfSCIENCE OF ADVANCED MATERIALS-
dc.citation.titleSCIENCE OF ADVANCED MATERIALS-
dc.citation.volume8-
dc.citation.number9-
dc.citation.startPage1790-
dc.citation.endPage1794-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusEFFICIENCY-
dc.subject.keywordAuthorCZTS-
dc.subject.keywordAuthorSolar Cell-
dc.subject.keywordAuthorSputtering-
dc.subject.keywordAuthorH2S-
dc.identifier.urlhttps://www.ingentaconnect.com/content/asp/sam/2016/00000008/00000009/art00012-
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