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Characteristics of SiNx thin films by Remote Plasma Atomic Layer Depostion using DTDN2-H2 precursor
- Authors
- 전형탁
- Issue Date
- 8-Nov-2018
- Place
- 여수 디오션 리조트
- Conference Name
- 2018년도 한국재료학회 추계학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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