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Cited 34 time in webofscience Cited 33 time in scopus
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Two-step flash light sintering process for enhanced adhesion between copper complex ion/silane ink and a flexible substrate

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dc.contributor.authorJeon, Eun-Beom-
dc.contributor.authorJoo, Sung-Jun-
dc.contributor.authorAhn, Heejoon-
dc.contributor.authorKim, Hak-Sung-
dc.date.accessioned2021-08-02T17:30:18Z-
dc.date.available2021-08-02T17:30:18Z-
dc.date.issued2016-03-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/23936-
dc.description.abstractA copper complex ion ink (including copper nanoparticles, a copper precursor and a silane coupling agent) was synthesized to enhance the adhesion between the copper pattern and a polyimide (PI) substrate. Oxygen plasma treatment was performed on the polyimide substrate to initiate a chemical reaction between the complex ion ink and the polyimide. Then, a two-step flash light sintering method (consisting of preheating and main sintering) was used to sinter the copper complex ion ink. The copper complex ion patterns were characterized as a function of the weight fraction of silane coupling agent using scanning electron microscopy (SEM), a four-point probe method and adhesion testing. In addition, a bending fatigue test was performed to evaluate the reliability of the conductive copper pattern under cyclic bending. The copper pattern fabricated with copper complex ion ink containing 3 wt% silane coupling agent exhibited the highest adhesion level (5B), the lowest resistivity (7.6 μΩ·cm) and a low resistance change (18%) after the bending fatigue test. The two-step sintering method used to enhance the adhesion between the copper complex ion ink and polyimide substrate was also studied using X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FT-IR).-
dc.format.extent9-
dc.language영어-
dc.language.isoENG-
dc.publisherElsevier Sequoia-
dc.titleTwo-step flash light sintering process for enhanced adhesion between copper complex ion/silane ink and a flexible substrate-
dc.typeArticle-
dc.publisher.location스위스-
dc.identifier.doi10.1016/j.tsf.2016.02.033-
dc.identifier.scopusid2-s2.0-84960415513-
dc.identifier.wosid000372794900062-
dc.identifier.bibliographicCitationThin Solid Films, v.603, pp 382 - 390-
dc.citation.titleThin Solid Films-
dc.citation.volume603-
dc.citation.startPage382-
dc.citation.endPage390-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusINTENSE PULSED-LIGHT-
dc.subject.keywordPlusPRINTED ELECTRONICS-
dc.subject.keywordPlusMOLECULAR-WEIGHT-
dc.subject.keywordPlusTHIN-FILM-
dc.subject.keywordPlusNANOPARTICLES-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusPATTERNS-
dc.subject.keywordPlusSTABILITY-
dc.subject.keywordPlusPOLYMER-
dc.subject.keywordPlusSILANE-
dc.subject.keywordAuthorTwo-step sintering method-
dc.subject.keywordAuthorFlash light sintering-
dc.subject.keywordAuthorCopper nanoparticle-
dc.subject.keywordAuthorCopper precursor-
dc.subject.keywordAuthorAdhesion-
dc.subject.keywordAuthorOxygen plasma-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0040609016001322?via%3Dihub-
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서울 공과대학 > 서울 기계공학부 > 1. Journal Articles
서울 공과대학 > 서울 유기나노공학과 > 1. Journal Articles

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