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The impact of ALD ZrO2 gate insulators on Indium Tin Zinc Oxide (ITZO) thin film transistor applications
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박진성 | - |
| dc.date.accessioned | 2021-08-02T19:34:19Z | - |
| dc.date.available | 2021-08-02T19:34:19Z | - |
| dc.date.issued | 2018-07-30 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/27768 | - |
| dc.title | The impact of ALD ZrO2 gate insulators on Indium Tin Zinc Oxide (ITZO) thin film transistor applications | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 8th International Conference on Atomic Layer Deposition and Atomic Layer Etching | - |
| dc.citation.conferencePlace | 대한민국 인천 송도 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)