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Poly-Si Stop Chemical-mechanical-planarization Slurry using Core(Polystyrene)/shell(wet ceria) Abrasive Enhancing Polishing-rate and Scratch-less
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박재근 | - |
| dc.date.accessioned | 2021-08-02T23:26:20Z | - |
| dc.date.available | 2021-08-02T23:26:20Z | - |
| dc.date.issued | 2017-11-08 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/30341 | - |
| dc.title | Poly-Si Stop Chemical-mechanical-planarization Slurry using Core(Polystyrene)/shell(wet ceria) Abrasive Enhancing Polishing-rate and Scratch-less | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | IUMRS-ICA 2017 | - |
| dc.citation.conferencePlace | Taipei Nangang Exhibition Hall | - |
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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