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Poly-Si Stop Chemical-mechanical-planarization Slurry using Core(Polystyrene)/shell(wet ceria) Abrasive Enhancing Polishing-rate and Scratch-less
- Authors
- 박재근
- Issue Date
- 8-Nov-2017
- Place
- Taipei Nangang Exhibition Hall
- Conference Name
- IUMRS-ICA 2017
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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