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Investigation of ramped voltage stress to screen defective magnetic tunnel junctions

Authors
Choi, ChulminSukegawa, HiroakiMitani, SeijiSong, Yunheub
Issue Date
Jan-2018
Publisher
IOP PUBLISHING LTD
Keywords
reliability; magnetic memory; device reliability
Citation
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.33, no.1
Indexed
SCIE
SCOPUS
Journal Title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume
33
Number
1
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/3172
DOI
10.1088/1361-6641/aa99bb
ISSN
0268-1242
Abstract
A ramped voltage stress (RVS) method to screen defective magnetic tunnel junctions (MTJs) is investigated in order to improve screen accuracy and shorten test time. Approximately 1500 MTJs with 1.25 nm thick tunnel barriers were fabricated for this evaluation, and normal MTJs show a 189% tunnel magnetoresistance ratio, a 365 Omega m(2) resistance-area product, and a 1.8 V breakdown voltage, which is enough for applying reliable screen tests. We successfully classified MTJs as normal MTJs having good characteristics or defective MTJs having insufficient endurance and showing resistance degradation after only short-term cycling. Using the RVS screen test with low ramp speed, it is demonstrated that remarkable screening performance and little dependence on temperature are obtained for short test time.
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