Atomic layer deposition: A versatile method to enhance TiO₂ nanoparticles interconnection of dye-sensitized solar cell at low temperature
- Authors
- Li, Yuelong; Ma, Linchuan; Yoo, Youngseok; Wang, Guangcai; Zhang, Xiaodan; Ko, Min Jae
- Issue Date
- May-2019
- Publisher
- ELSEVIER SCIENCE INC
- Keywords
- Dye-sensitized solar cell; Atomic layer deposition; Low temperature process; Titanium dioxide; Interparticles connection
- Citation
- JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY, v.73, pp.351 - 356
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY
- Volume
- 73
- Start Page
- 351
- End Page
- 356
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/32881
- DOI
- 10.1016/j.jiec.2019.02.006
- ISSN
- 1226-086X
- Abstract
- A thin TiO2 layer is introduced by atomic layer deposition (ALD) onto the surface of TiO2 host-particles at low-temperature, which serves as binding layer to enhance the interconnection of TiO2 host-nanoparticles of photoelectrode or adhesion of photoelectrode with substrate. The power conversion efficiency of 4.63%, corresponding to 50% enhancement compared with 3.09% of reference cell, is achieved from ALD-treated cell. The electrochemical impedance spectroscopy confirms the reduced internal resistance and much longer electron lifetime in ALD-treated cell. These results suggest that ALD technique can be used as an effective and precise technique to construct efficient dye-sensitized solar cells at low-temperature.
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