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Improved Characteristics and Vth Modulation of FD-SOI Tunnel Field Effect Transistor (TFET) using ALD HfAlOx and TiN Gate Stack
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 최창환 | - |
| dc.date.accessioned | 2021-08-03T04:26:31Z | - |
| dc.date.available | 2021-08-03T04:26:31Z | - |
| dc.date.issued | 2017-02-15 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/33718 | - |
| dc.title | Improved Characteristics and Vth Modulation of FD-SOI Tunnel Field Effect Transistor (TFET) using ALD HfAlOx and TiN Gate Stack | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 한국반도체학술대회 | - |
| dc.citation.conferencePlace | 대명 비발디파크, 대한민국 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)