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Atomic Layer Deposited Gate Spacer for New Memory Devices

Authors
전형탁
Issue Date
16-Nov-2016
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/34292
Place
경주
Conference Name
한-일 재료공학 심포지엄
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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