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Improvement of SRAF application margin and imaging performance of isolated patterns by using attenuated phase shift mask
- Authors
- 안진호
- Issue Date
- 24-Oct-2016
- Place
- 일본 히로시마
- Conference Name
- 2016 EUVL symposium
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)