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NH3 Pre-Plasma Treatment to Reduce Interface State Density of GaN MOS Device
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 최창환 | - |
| dc.date.accessioned | 2021-08-03T06:28:47Z | - |
| dc.date.available | 2021-08-03T06:28:47Z | - |
| dc.date.created | 2021-06-30 | - |
| dc.date.issued | 2016-05-19 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/36606 | - |
| dc.publisher | 한국재료학회 | - |
| dc.title | NH3 Pre-Plasma Treatment to Reduce Interface State Density of GaN MOS Device | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 최창환 | - |
| dc.identifier.bibliographicCitation | 한국재료학회 춘계학술대회 | - |
| dc.relation.isPartOf | 한국재료학회 춘계학술대회 | - |
| dc.citation.title | 한국재료학회 춘계학술대회 | - |
| dc.citation.conferencePlace | 여수 디오션리조트 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 2 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)