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Post Annealing Characteristics of Few-Layers Tin Disulfide by Atomic Layer Deposition Method
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-08-03T06:30:31Z | - |
| dc.date.available | 2021-08-03T06:30:31Z | - |
| dc.date.issued | 2016-05-02 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/36837 | - |
| dc.title | Post Annealing Characteristics of Few-Layers Tin Disulfide by Atomic Layer Deposition Method | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2016 EMRS spring meeting | - |
| dc.citation.conferencePlace | 프랑스 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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