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Post Annealing Characteristics of Few-Layers Tin Disulfide by Atomic Layer Deposition Method
- Authors
- 전형탁
- Issue Date
- 2-May-2016
- Place
- 프랑스
- Conference Name
- 2016 EMRS spring meeting
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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