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A simulation model for reliability prediction of progressive breakdown in ultra-thin gate oxides

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dc.contributor.author배석주-
dc.date.accessioned2021-08-03T06:59:58Z-
dc.date.available2021-08-03T06:59:58Z-
dc.date.issued2015-11-07-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/38349-
dc.titleA simulation model for reliability prediction of progressive breakdown in ultra-thin gate oxides-
dc.typeConference-
dc.citation.conferenceNameEAWIE 2015-
dc.citation.conferencePlace서울 연세대학교-
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