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Thermoelectric Properties of Multi-stack Al Doped ZnO Layer Structure Using Atomic Layer Deposition

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dc.contributor.author박진성-
dc.date.accessioned2021-08-03T07:26:49Z-
dc.date.available2021-08-03T07:26:49Z-
dc.date.created2021-07-01-
dc.date.issued2015-06-29-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/39722-
dc.publisherAmerican Vacuum Society-
dc.titleThermoelectric Properties of Multi-stack Al Doped ZnO Layer Structure Using Atomic Layer Deposition-
dc.typeConference-
dc.contributor.affiliatedAuthor박진성-
dc.identifier.bibliographicCitation15th International Conference on Atomic Layer Deposition-
dc.relation.isPartOf15th International Conference on Atomic Layer Deposition-
dc.citation.title15th International Conference on Atomic Layer Deposition-
dc.citation.conferencePlacePotland, Oregon USA-
dc.type.rimsCONF-
dc.description.journalClass1-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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