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Tungsten Carbide Film for Gate Electrode Deposited by Remote Plasma Atomic Layer Deposition
- Authors
- 전형탁
- Issue Date
- 29-Jun-2015
- Place
- Portland Hilton
- Conference Name
- ALD 2015
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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