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극자외선 노광 공정용 half-tone 위상 변위 마스크 제작 공정 시 absorber stack의 sidewall angle의 영향
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2021-08-03T08:18:05Z | - |
| dc.date.available | 2021-08-03T08:18:05Z | - |
| dc.date.issued | 2015-04-01 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/41296 | - |
| dc.title | 극자외선 노광 공정용 half-tone 위상 변위 마스크 제작 공정 시 absorber stack의 sidewall angle의 영향 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제4회 차세대리소그래피학술대회 | - |
| dc.citation.conferencePlace | 서울 COEX | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)