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Characteristics of TiO2 thin film by remote plasma atomic layer deposition using a novel Ti precursor
- Authors
- 전형탁
- Issue Date
- 28-Nov-2014
- Place
- 대전컨벤션센터
- Conference Name
- 2014년도 한국재료학회 추계학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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