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Enhancement of the Electrical Characteristics due to an Embedded Low-k Dielectric Layer between a Transition Metal Layer and an Oxide Layer in Resistive Random Access Memory Devices
- Authors
- 김태환
- Issue Date
- 6-Nov-2014
- Publisher
- Gwangju-Jeonnam Nanotechnology Union
- Citation
- The 12th International Conference on Nano Science and Nano Technology
- Conference Name
- The 12th International Conference on Nano Science and Nano Technology
- Place
- Mokpo National University & Shangria Beach Hotel, Korea
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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