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An Industrial Scale Spatial Atomic Layer Deposition of Al2O3 Films as a Moisture Permation Barrier at Low Temperature (˂100℃)
- Authors
- 전형탁
- Issue Date
- 18-Jun-2014
- Place
- Hotel Granvia Kyoto
- Conference Name
- ALD 2014
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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