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Improved Integration of High-K Dielectric on MoS2 by Using Metal Oxide Seed Layer
- Authors
- 최창환
- Issue Date
- 15-May-2014
- Publisher
- 한국재료학회
- Citation
- 한국재료학회 춘계학술대회
- Conference Name
- 한국재료학회 춘계학술대회
- Place
- 창원 컨벤션센터
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)