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Characteristics of Tin Sulfide Grown Thin films using Tetrakis(dimethylamino)Tin and Hydrogen Sulfur by Atomic Layer Deposition

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dc.contributor.author전형탁-
dc.date.accessioned2021-08-03T11:19:56Z-
dc.date.available2021-08-03T11:19:56Z-
dc.date.issued20131107-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/45985-
dc.titleCharacteristics of Tin Sulfide Grown Thin films using Tetrakis(dimethylamino)Tin and Hydrogen Sulfur by Atomic Layer Deposition-
dc.typeConference-
dc.citation.conferenceName2013 한국재료학회 추계학술발표대회-
dc.citation.conferencePlace제주도 롯데호텔-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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