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The effecs of oxygen partial pressures in Ge doped InGaO Thin Film Transistors

Authors
박진성
Issue Date
5-Jul-2013
Publisher
한국물리학회, 자연과학종합연구원
Citation
the 16th International Symposium on the Physics of Semiconductors and Applications
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/47536
Conference Name
the 16th International Symposium on the Physics of Semiconductors and Applications
Place
Ramada Plaza Jeju hotel, Jeju, Koera
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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Park, Jinseong
COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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