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Calculation of the Optical Constants Using X-ray Reflectometer for Verifying the Optical Design of the Attenuated Phase Shift Mask
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2021-08-03T12:34:12Z | - |
| dc.date.available | 2021-08-03T12:34:12Z | - |
| dc.date.issued | 20130610 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/47879 | - |
| dc.title | Calculation of the Optical Constants Using X-ray Reflectometer for Verifying the Optical Design of the Attenuated Phase Shift Mask | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2013 International Workshop on EUV Lithography | - |
| dc.citation.conferencePlace | 미국 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)