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Stochastic Resist Patterning Simulation using Attenuated PSM for EUV Lithography
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2021-08-03T13:19:29Z | - |
| dc.date.available | 2021-08-03T13:19:29Z | - |
| dc.date.issued | 2013-02-27 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/48902 | - |
| dc.title | Stochastic Resist Patterning Simulation using Attenuated PSM for EUV Lithography | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2013 SPIE Advanced Lithography | - |
| dc.citation.conferencePlace | 미국 | - |
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)