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The impact of niobium dopant in TiOx Thin film transistors under electrical gate bias stresses
- Authors
- 박진성
- Issue Date
- 28-Aug-2012
- Publisher
- KIDS, SID
- Citation
- The 121th International Meeting on Information Display(IMID 2012)
- Conference Name
- The 121th International Meeting on Information Display(IMID 2012)
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)