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Negative electron-beam resist hard mask ion beam etching process for the fabrication of nanoscale spin transfer torque magnetic random access memory device
- Authors
- 이승백
- Issue Date
- 12-Jul-2012
- Place
- Bexco, Busan, Korea
- Conference Name
- International Conference on Magnetism
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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Related Researcher
- Lee, Seung Beck
- COLLEGE OF ENGINEERING (SCHOOL OF ELECTRONIC ENGINEERING)