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Characteristics of Nickel Thin Film Deposited by plasma enhanced ALD using Ni(EtCp)2
- Authors
- 전형탁
- Issue Date
- 11-Apr-2012
- Place
- 샌프란시스코, 미국
- Conference Name
- 2012 MRS Spring meeting
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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