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Effective Oxidation Method to Fabricate Relaxed SiGe-on-Insulator (SGOI) Substrate with High Ge Concentration by Ge Condensation

Authors
박재근
Issue Date
20-Oct-2011
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/53897
Place
부산 BEXCO
Conference Name
2011 한국물리학회 가을학술논문발표회
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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