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Design of Extreme Proximity Gettering for Advanced Semiconductor Devices Beyond 3X nm Technology - Understanding the dependency of Ta decoration on crystalline nature after device heat-treatment of 3X technology

Authors
박재근
Issue Date
14-Oct-2011
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/53977
Place
Westin Boston Waterfront and the Boston Convention and Exhibition Center
Conference Name
2011 SiWEDS Fall Meeting
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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